Theory and Application of Laser Chemical Vapor Deposition
Title:
Theory and Application of Laser Chemical Vapor Deposition
ISBN:
9781489914309
Personal Author:
Edition:
1st ed. 1995.
Publication Information New:
New York, NY : Springer US : Imprint: Springer, 1995.
Physical Description:
XII, 396 p. online resource.
Series:
Lasers, Photonics, and Electro-Optics
Contents:
1. Introduction -- 2. Pyrolytic LCVD -- 3. Photolytic LCVD -- 4. Pyrolytic LCVD Modeling -- 5. Photolytic LCVD Modeling -- A.1. Definitions of Energy Density, Irradiance, and Intensity -- A.2. Thermal Stress Analysis -- A.3. Volumetric Absorption Rate -- Nomenclature -- References.
Abstract:
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
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Electronic Access:
Full Text Available From Springer Nature Engineering Archive Packages
Language:
English