Rapid Thermal Processing of Semiconductors
Titre:
Rapid Thermal Processing of Semiconductors
ISBN (Numéro international normalisé des livres):
9781489918048
Auteur personnel:
Edition:
1st ed. 1997.
PRODUCTION_INFO:
New York, NY : Springer US : Imprint: Springer, 1997.
Description physique:
XXII, 358 p. online resource.
Collections:
Microdevices, Physics and Fabrication Technologies
Table des matières:
1. Transient Heating of Semiconductors by Radiation -- 2. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals -- 3. Crystallization, Impurity Diffusion, and Segregation in Polycrystalline Silicon -- 4. Component Evaporation, Defect Annealing, and Impurity Diffusion in the III-V Semiconductors -- 5. Diffusion Synthesis of Silicides in Thin-Film Metal-Silicon Structures -- 6. Rapid Thermal Oxidation and Nitridation -- 7. Rapid Thermal Chemical Vapor Deposition -- References.
Extrait:
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Auteur ajouté:
Auteur collectif ajouté:
Accès électronique:
Full Text Available From Springer Nature Physics and Astronomy Archive Packages
Langue:
Anglais