Theory and Application of Laser Chemical Vapor Deposition
Título:
Theory and Application of Laser Chemical Vapor Deposition
ISBN:
9781489914309
Autor Pessoal:
Edição:
1st ed. 1995.
PRODUCTION_INFO:
New York, NY : Springer US : Imprint: Springer, 1995.
Descrição Física:
XII, 396 p. online resource.
Série:
Lasers, Photonics, and Electro-Optics
Conteúdo:
1. Introduction -- 2. Pyrolytic LCVD -- 3. Photolytic LCVD -- 4. Pyrolytic LCVD Modeling -- 5. Photolytic LCVD Modeling -- A.1. Definitions of Energy Density, Irradiance, and Intensity -- A.2. Thermal Stress Analysis -- A.3. Volumetric Absorption Rate -- Nomenclature -- References.
Resumo:
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Autor Adicionado:
Autor Corporativo Adicionado:
Acesso Eletrônico:
Full Text Available From Springer Nature Engineering Archive Packages
LANGUAGE:
Inglês